精密離子蝕刻鍍膜系統
精密離子蝕刻鍍膜系統
- It is a cost effective, affordable, next-generation apparatus for the preparation of metallographic samples that do not require sputter coating.
- Typical applications include Scanning Electron Microscopy (SEM or high resolution FESEM) and Light Microscopy (LM).
- Quality samples are produced in a clean environment, under a controlled process with reproducible results.
- The ion beam etching technique used avoids the hazards and costs associated with wet chemical etching.
儀器設備說明
| Ion Guns | |
| Ion gun | One Penning ion gun with miniature rare earth magnets |
| Ion Beam Energy | 1.0keV to 10.0keV |
| Beam Diameter | About 5mm FWHM |
| Ion Current Density | 10mA/cm2 Peak |
| Gas throughput | Argon at 0.1cc/minute/gun |
| Etched Area | About 7mm - 10mm dependent on gun energy |
| Etching Rate | Approximately 10µm/hr for Silicon and 3µm/hr for Tungsten at 10.0keV |
| Airlock Assembly | |
| Sample Holder | Accepts 1畧 inch Metallographic mounts and most SEM stubs |
| Sample Rotation | Variable speed 10 - 60rpm |
| Sample Tilt | Fixed angle or variable rocking angle (0° - 90°) |
| Sample Rocking | Variable speed 5°/sec - 36°/sec |
| Option | TEM adapters for side-entry TEM or SEM holders |
收費標準
| 項目 | 價格 | 服務對象 | |
| 1 | 訓練認證 | 1500元/梯 | 中山校內任系所皆可 |
| 2 | 自行操作 | 200元/時 | 限經認證許可資格者 |
| 400元/時 | 中山校內任系所皆可 | ||
| 3 | 委託操作 | 600元/時 | 校外 |
| 1200元/時 | 一般廠商 | ||
| 備註 | 儀器操作時間未滿一小時者，以一小時計費 | ||
聯絡方式 :
負責教授： 張六文 教授 工學院 材料與光電科學系 TEL：07-5252000轉4060
聯絡人： 顏采蓉 材料與光電科學系 TEL：07-5252000轉4085
儀器地點：國立中山大學國際研究大樓地下1樓(IR0001)
負責教授:
張六文教授
助理:
顏采蓉
聯絡方式:
(07)5252000 ext. 4085
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